Staff Researcher - Selective area deposition by atomic layer deposition for microelectronics

Staff Researcher - Selective area deposition by atomic layer deposition for microelectronics

Job Reference: Ref.04.24.23/1

Employer: International Iberian Nanotechnology Laboratory (INL)

Location: Braga, Portugal

Group/Unit: Salomé Research Group

Number of Vacancies: 1

Employment Type: Full time

Contract Duration: 36 months

Open Date for Applications: August 22nd, 2024

Closing Date for Applications: September 22nd, 2024, 23h00m (Lisbon Time)

Key words: #AtomicLayerDeposition(ALD) #SelectiveAreaDeposition(SAD) #surfacecharacterisation #nanofabrication

Overview

The Salomé Research Group is dedicated to developing nanofabrication and applications for optoelectronics and energy. Focused on developing nanofabrication solutions for a diverse set of applications, via several mechanisms such as competitive funding projects and industrial services. The group aims to keep advancing the state-of-the-art in several areas.

We are looking for a qualified Researcher to join our team in developing area selective deposition (SAD) based on atomic layer deposition (ALD) processes. We will develop work in collaboration with a multinational semiconductor company with the aim of developing clean room nanofabrication processes compatible with the mid-term industry needs in the area of microelectronics.

The three-year project consists of the procurement and installation of a ALD tool tailored for SAD and the development of nanometre scale processes that are compatible with advanced micro-electronics high end fabrication. This project will place the researcher and INL in a unique position worldwide allowing for the developed processes to be implemented by the industrial partner in several applications.

Job Duties

The job duties will be the following:

• Experimental Design and Execution:
  • Develop experimental strategies and protocols for selective area deposition using ALD, considering parameters such as substrate material, surface preparation, precursor choice, and deposition conditions;
  • Execute experiments meticulously, ensuring reproducibility and accuracy in results.

• Process Optimisation:
  • Optimise ALD processes for selective area deposition, aiming for precise control over film thickness, uniformity, and conformity on targeted areas;
  • Explore parameter space systematically, employing techniques such as Design of Experiments (DOE) to identify optimal process conditions.

• Characterisation and Analysis:
  • Perform comprehensive characterisation of deposited films using techniques such as ellipsometry, X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), and scanning electron microscopy (SEM);
  • Analyse data to assess film quality, uniformity, adhesion, and other relevant properties.

• Collaboration and Communication:
  • Collaborate closely with internal and external partners to under